共 50 条
- [41] SENSITIVITY OF DIAZOQUINONE RESISTS TO OPTICAL AND ELECTRON-BEAM EXPOSURE POLYMER ENGINEERING AND SCIENCE, 1980, 20 (16): : 1073 - 1076
- [44] Use of positive and negative chemically amplified resists in electron-beam direct-write lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 2986 - 2993
- [45] Evaluation of calixarene-derivatives as high-resolution negative tone electron-beam resists JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 2958 - 2961
- [46] Comparison of negative resists for 100 nm electron-beam direct write and mask making applications JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3289 - 3293
- [47] ELECTRON-BEAM SENSITIVITY OF CROSS-LINKED ACRYLATE RESISTS ACS SYMPOSIUM SERIES, 1987, 346 : 86 - 100
- [48] RESISTS AND PROCESSES FOR 1 KV ELECTRON-BEAM MICROCOLUMN LITHOGRAPHY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (03): : 812 - 820
- [50] Molecular resists based on cholate derivatives for electron-beam lithography JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (6B): : 5435 - 5439