REACTIVE PLASTICIZERS IN NEGATIVE ELECTRON-BEAM RESISTS

被引：2

|

作者：

NAMASTE, YMN

OBENDORF, SK

RODRIGUEZ, F

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584090

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：2245 / 2248

页数：4

相关论文

共 50 条

[31] IMAGE DEFINITION IN HALOGENATED POLYSTYRENE ELECTRON-BEAM RESISTS
BRAULT, RG
JENSEN, JE
GRANGER, DD
VANAST, CI
MILLER, LJ
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (06) : C233 - C233
[32] POSITIVE RESISTS FOR DIRECT WRITE ELECTRON-BEAM LITHOGRAPHY
GOZDZ, AS
SOLID STATE TECHNOLOGY, 1987, 30 (06) : 75 - 79
[33] PLASMA-DEVELOPABLE ELECTRON-BEAM RESISTS.
Yoneda, Yasuhiro
Fukuyama, Shun-ichi
Fujitsu Scientific and Technical Journal, 1987, 23 (01): : 37 - 43
[34] PROXIMITY EFFECTS IN ELECTRON-BEAM EXPOSURE OF MULTILAYER RESISTS
GREENEICH, JS
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C106 - C106
[35] Acrylic polymer/silica hybrid for electron-beam resists
Tamai, T
Matsuura, Y
Watanabe, M
Matsukawa, K
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 2006, 44 (06) : 2107 - 2116
[36] Surface tension and adhesion of photo and electron-beam resists
Bauer, J
Drescher, G
Silz, H
Frankenfeld, H
Illig, M
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIV, 1997, 3049 : 640 - 649
[37] METHOD FOR RAPIDLY SCREENING POLYMERS AS ELECTRON-BEAM RESISTS
BRAULT, RG
MILLER, LJ
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C106 - C106
[38] A METHOD FOR RAPIDLY SCREENING POLYMERS AS ELECTRON-BEAM RESISTS
BRAULT, RG
MILLER, LJ
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (05) : 1158 - 1161
[39] MEMORY STORAGE IN POSITIVE ELECTRON-BEAM RESISTS.
Hiraoka, H.
IBM Technical Disclosure Bulletin, 1973, 16 (01):
[40] Molecular design for new positive electron-beam resists
Nagasaki, Yukio
ACS Symposium Series, 706 : 276 - 289

← 1 2 3 4 5 →