EFFECT OF CARBON AND OXYGEN PRECIPITATION ON GOLD DIFFUSION IN SILICON

被引：2
|
作者：
ITOH, Y
SUGITA, Y
NOZAKI, T
机构：
[1] TOYAMA UNIV,DEPT PHYS,TOYAMA 930,JAPAN
[2] KITAZATO UNIV,DEPT HYG SCI,SAGAMIHARA,KANAGAWA 228,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 10期
关键词：
D O I：
10.1143/JJAP.28.1746
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1746 / 1749
页数：4
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