EFFECT OF HEAT-TREATMENT ON STRESS IN AMORPHOUS SILICON FILMS

被引：2
|
作者：
KOOS, V [1 ]
NEUMANN, HG [1 ]
机构：
[1] UNIV ROSTOCK,SEKT PHYS,ROSTOCK,GER DEM REP
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1976年 / 36卷 / 01期
关键词：
D O I：
10.1002/pssa.2210360159
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：K47 / K49
页数：3
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