EFFECT OF HEAT-TREATMENT ON STRESS IN AMORPHOUS SILICON FILMS

被引：2

作者：

KOOS, V ^{[1
]}

NEUMANN, HG ^{[1
]}

机构：

[1] UNIV ROSTOCK,SEKT PHYS,ROSTOCK,GER DEM REP

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1976年 / 36卷 / 01期

关键词：

D O I：

10.1002/pssa.2210360159

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：K47 / K49

页数：3

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