LASER CHEMICAL VAPOR-DEPOSITION USING CW AND PULSED LASERS

被引：0

作者：

ALLEN, SD

机构：

来源：

PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1982年 / 346卷

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中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：25 / 30

页数：6

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[21] LASER CHEMICAL VAPOR-DEPOSITION - A TECHNIQUE FOR SELECTIVE AREA DEPOSITION
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[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) : 6501 - 6505
[22] APPLICATION OF METALORGANIC CHEMICAL VAPOR-DEPOSITION TO LASERS FOR INTEGRATED OPTOELECTRONICS
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[J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1981, 269 : 8 - 12
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[J]. SEMICONDUCTORS AND SEMIMETALS, 1984, 21 : 109 - 122
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[27] CHEMICAL VAPOR-DEPOSITION
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[29] PULSED-LASER INDUCED VAPOR-DEPOSITION OF SILICON FILM
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[30] LASER CHEMICAL VAPOR-DEPOSITION OF THIN ALUMINUM COATINGS
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