CHEMICAL VAPOR-DEPOSITION

被引：16

作者：

ARCHER, NJ

机构：

来源：

PHYSICS IN TECHNOLOGY | 1979年 / 10卷 / 04期

关键词：

D O I：

10.1088/0305-4624/10/4/I03

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：152 / 161

页数：10

共 50 条

[1] CHEMICAL VAPOR-DEPOSITION
HIROSE, M
[J]. SEMICONDUCTORS AND SEMIMETALS, 1984, 21 : 109 - 122
[2] CHEMICAL VAPOR-DEPOSITION
JENSEN, KF
[J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 5 - IAEC
[3] CHEMICAL VAPOR-DEPOSITION
JENSEN, KF
[J]. ADVANCES IN CHEMISTRY SERIES, 1989, (221): : 199 - 263
[4] HOMOGENEOUS CHEMICAL VAPOR-DEPOSITION
SCOTT, BA
OLBRICHT, WL
MEYERSON, BA
REIMER, JA
WOLFORD, DJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 450 - 456
[5] LASERS IN CHEMICAL VAPOR-DEPOSITION
不详
[J]. MICROELECTRONICS AND RELIABILITY, 1973, 12 (02): : 177 - &
[6] HOMOGENEOUS CHEMICAL VAPOR-DEPOSITION
SCOTT, BA
[J]. SEMICONDUCTORS AND SEMIMETALS, 1984, 21 : 123 - 149
[7] SAFETY IN CHEMICAL VAPOR-DEPOSITION
HAMMOND, ML
[J]. SOLID STATE TECHNOLOGY, 1980, 23 (12) : 104 - 109
[8] MECHANISMS OF CHEMICAL VAPOR-DEPOSITION
GILING, LJ
[J]. MATERIALS CHEMISTRY AND PHYSICS, 1983, 9 (1-3) : 117 - 138
[9] CHEMICAL VAPOR-DEPOSITION OF SUPERCONDUCTORS
WAHL, G
SCHMADERER, F
[J]. JOURNAL OF MATERIALS SCIENCE, 1989, 24 (04) : 1141 - 1158
[10] METALORGANIC CHEMICAL VAPOR-DEPOSITION
DAPKUS, PD
[J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1982, 12 : 243 - 269