APPLICATION OF METALORGANIC CHEMICAL VAPOR-DEPOSITION TO LASERS FOR INTEGRATED OPTOELECTRONICS

被引：0

作者：

DAPKUS, PD

机构：

来源：

PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1981年 / 269卷

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暂无

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：8 / 12

页数：5

共 50 条

[1] METALORGANIC CHEMICAL VAPOR-DEPOSITION
DAPKUS, PD
[J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1982, 12 : 243 - 269
[2] METALORGANIC CHEMICAL VAPOR-DEPOSITION
MILLER, LM
COLEMAN, JJ
[J]. CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1988, 15 (01): : 1 - 26
[3] NONPLANAR GAAS/GAALAS LASERS BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
BURNHAM, RD
FEKETE, D
SCIFRES, DR
STREIFER, W
[J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1981, 272 : 84 - 86
[4] LASERS IN CHEMICAL VAPOR-DEPOSITION
不详
[J]. MICROELECTRONICS AND RELIABILITY, 1973, 12 (02): : 177 - &
[5] LASERS IN CHEMICAL VAPOR-DEPOSITION
不详
[J]. SOLID STATE TECHNOLOGY, 1973, 16 (07) : 12 - 12
[6] ALGAAS-GAAS LASERS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION - A REVIEW
DUPUIS, RD
[J]. JOURNAL OF CRYSTAL GROWTH, 1981, 55 (01) : 213 - 222
[7] EFFECTS OF ORDERING ON THE OPERATION OF ALGAINP LASERS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
NAKANO, K
TODA, A
YAMAMOTO, T
ISHIBASHI, A
[J]. APPLIED PHYSICS LETTERS, 1992, 61 (16) : 1959 - 1961
[8] REFLECTING ON METALORGANIC CHEMICAL VAPOR-DEPOSITION (MOCVD)
MANASEVIT, HM
[J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 323 : 94 - 99
[9] GROWTH OF ZNS BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
FUJITA, S
TOMOMURA, Y
SASAKI, A
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (09): : L583 - L585
[10] THE GROWTH OF ALGAAS-GAAS LASERS ON SI SUBSTRATES BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
DUPUIS, RD
PINZONE, CJ
[J]. JOURNAL OF CRYSTAL GROWTH, 1988, 93 (1-4) : 434 - 442

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