LUBRICATION WITH THIN METAL-FILMS

被引：0
|
作者：
KUWAHARA, K [1 ]
机构：
[1] HIROSHIMA UNIV,FAC ENGN,HIROSHIMA,HIROSHIMA,JAPAN
来源：
JOURNAL OF JAPAN SOCIETY OF LUBRICATION ENGINEERS | 1974年 / 19卷 / 10期
关键词：
D O I：
暂无
中图分类号：
TH [机械、仪表工业];
学科分类号：
0802 ;
摘要：
引用
收藏
页码：745 / 748
页数：4
相关论文
共 50 条
  • [41] ELECTRICAL-PROPERTIES OF VERY THIN METAL-FILMS
    HOFFMANN, H
    HORNAUER, H
    JACOB, U
    VANCEA, J
    THIN SOLID FILMS, 1985, 131 (1-2) : 1 - 13
  • [42] A TENSILE TESTING MACHINE FOR EVAPORATED THIN METAL-FILMS
    YOSHII, K
    TAKAGI, H
    UMENO, M
    KAWABE, H
    JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1983, 16 (02): : 127 - 130
  • [43] REEMITTED-POSITRON SPECTROSCOPY OF THIN METAL-FILMS
    GIDLEY, DW
    FRIEZE, WE
    PHYSICAL REVIEW LETTERS, 1988, 60 (12) : 1193 - 1196
  • [44] EPITAXIAL GRAIN-GROWTH IN THIN METAL-FILMS
    THOMPSON, CV
    FLORO, J
    SMITH, HI
    JOURNAL OF APPLIED PHYSICS, 1990, 67 (09) : 4099 - 4104
  • [45] ELECTRON-TRANSPORT IN ISOTROPIC THIN METAL-FILMS
    HALPERN, V
    JOURNAL OF PHYSICS F-METAL PHYSICS, 1971, 1 (05): : 608 - 617
  • [46] ANGULAR-CORRELATION STUDIES OF THIN METAL-FILMS
    ARAVIN, LG
    VALIEV, KA
    GOLDANSKII, VI
    NOVIKOV, YA
    RAKOV, AV
    FILIMONOV, MK
    SHANTAROVICH, VP
    CRYSTAL RESEARCH AND TECHNOLOGY, 1988, 23 (03) : 431 - 435
  • [47] THE INTRINSIC STRESS OF POLYCRYSTALLINE AND EPITAXIAL THIN METAL-FILMS
    KOCH, R
    JOURNAL OF PHYSICS-CONDENSED MATTER, 1994, 6 (45) : 9519 - 9550
  • [48] OPTICAL METHODS FOR THICKNESS MEASUREMENTS ON THIN METAL-FILMS
    POKROWSKY, P
    APPLIED OPTICS, 1991, 30 (22) : 3228 - 3232
  • [49] PULSED LASER ABLATIVE DEPOSITION OF THIN METAL-FILMS
    MOGYOROSI, P
    SZORENYI, T
    BALI, K
    TOTH, Z
    HEVESI, I
    APPLIED SURFACE SCIENCE, 1989, 36 (1-4) : 157 - 163
  • [50] PHOTOCHEMISTRY AT CORRUGATED THIN METAL-FILMS - A PHENOMENOLOGICAL APPROACH
    LEUNG, PT
    KIM, YS
    GEORGE, TF
    PHOTOCHEMISTRY IN THIN FILMS, 1989, 1056 : 139 - 146
12345