共 50 条
- [21] PREPARATION OF THIN SILICON FILMS FOR TRANSMISSION ELECTRON MICROSCOPY BY PHOTOLITHOGRAPHY AND DYNAMIC ETCHINGJOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1970, 3 (09): : 702 - +BOITSOV, YPPROKHOROV, VISOROKIN, LM
- [22] ETCHING OF SILICON NITRIDE IN PHOSPHORIC ACID WITH SILICON DIOXIDE AS A MASKJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (08) : 869 - +VANGELDER, WHAUSER, VE
- [23] Catalytic plasma chemical etching of silicon and silicon dioxide.FUNDAMENTAL PROBLEMS OF OPTOELECTRONICS AND MICROELECTRONICS, 2003, 5129 : 288 - 294Dikarev, YISurovtsev, ISTsvetkov, SM
- [24] SILICON DIOXIDE AS MASKING FILM IN ALKALINE ETCHINGJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (02) : 512 - 512BARYCKA, ITETERYCZ, H
- [25] SELECTIVE REACTIVE ION ETCHING OF SILICON DIOXIDESOLID STATE TECHNOLOGY, 1984, 27 (04) : 214 - 219CHANG, JS
- [26] FAST ETCHING IMPERFECTIONS IN SILICON DIOXIDE FILMSJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (01) : 89 - &LOPEZ, AD
- [27] MODELING LAMINAR DRY ETCHING OF SILICON DIOXIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (12) : 3626 - 3631BUSSE, JESMITH, GWCLEMENTS, LD
- [28] Vapour-etching-based porous silicon:: a new approachTHIN SOLID FILMS, 2002, 405 (1-2) : 29 - 34Saadoun, MMliki, NKaabi, HDaoudi, KBessaïs, BEzzaouia, HBennaceur, R
- [29] ETCHING OF SILICON NITRIDE IN PHOSPHORIC ACID USING SILICON DIOXIDE AS A MASKJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (12) : C315 - +VANGELDER, WHAUSER, VE
- [30] HIGH-TEMPERATURE PLASMA-ETCHING OF SILICON AND SILICON DIOXIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : C81 - C81CHIU, KCRSNOW, WR