EFFECTS OF APPLIED MAGNETIC-FIELDS ON SILICON-OXIDE FILMS FORMED BY MICROWAVE PLASMA CVD

被引：13
|
作者：
FUKUDA, T [1 ]
SUZUKI, K [1 ]
TAKAHASHI, S [1 ]
MOCHIZUKI, Y [1 ]
OHUE, M [1 ]
MOMMA, N [1 ]
SONOBE, T [1 ]
机构：
[1] HITACHI LTD, HITACHI WORKS, HITACHI, IBARAKI 317, JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1988年 / 27卷 / 10期
关键词：
D O I：
10.1143/JJAP.27.L1962
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L1962 / L1965
页数：4
相关论文
共 50 条
  • [41] EVALUATION OF PLASMA SILICON-OXIDE FILMS (P-SIO) BY AN INFRARED-ABSORPTION METHOD
    TAKAMATSU, A
    SHIBATA, M
    ISHIDA, M
    SAKAI, H
    YOSHIMI, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (03) : C90 - C90
  • [42] THE ROLE OF SILANE AND N2O IN THE CO2 LASER-CVD OF SILICON-OXIDE FILMS
    FERNANDEZ, D
    GONZALEZ, P
    POU, J
    GARCIA, E
    SERRA, J
    LEON, B
    PEREZAMOR, M
    APPLIED SURFACE SCIENCE, 1993, 69 (1-4) : 281 - 284
  • [43] EFFECTS OF MAGNETIC-FIELDS AND FLOW APPLIED TO SINGLE ELECTRODES ON ELECTROLYTIC CELL POTENTIALS
    DASH, J
    TAKEO, M
    JOURNAL OF APPLIED PHYSICS, 1984, 55 (06) : 2604 - 2605
  • [44] STRESS-FREE AND MOISTURE INSENSITIVE SILICON-OXIDE DIELECTRIC FILMS FORMED BY MOLECULAR-BEAM DEPOSITION
    CHAND, N
    KOLA, RR
    OPILA, RL
    COMIZZOLI, RB
    KRAUTTER, H
    SERGENT, AM
    TSANG, WT
    OSENBACH, JW
    LUFTMAN, HS
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (05) : 3315 - 3322
  • [45] EFFECTS OF APPLIED MAGNETIC-FIELDS ON PERFORMANCE OF A QUASI-STEADY MAGNETOPLASMADYNAMIC ARCJET
    TAHARA, H
    KAGAYA, Y
    YOSHIKAWA, T
    JOURNAL OF PROPULSION AND POWER, 1995, 11 (02) : 337 - 342
  • [46] THERMAL ANNEALING EFFECTS ON THE MECHANICAL-PROPERTIES OF PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITED SILICON-OXIDE FILMS
    SCHLIWINSKI, HJ
    SCHNAKENBERG, U
    WINDBRACKE, W
    NEFF, H
    LANGE, P
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (06) : 1730 - 1735
  • [47] Microwave surface impedance of YBCO thin films in DC applied magnetic fields
    Powell, JR
    Porch, A
    Wellhofer, F
    Woodall, P
    Humphreys, RG
    Gough, CE
    APPLIED SUPERCONDUCTIVITY 1995, VOLS. 1 AND 2: VOL 1: PLENARY TALKS AND HIGH CURRENT APPLICATIONS; VOL 2: SMALL SCALE APPLICATIONS, 1995, 148 : 1119 - 1122
  • [48] SOME ETCH PROPERTIES OF DOPED AND UNDOPED SILICON-OXIDE FILMS FORMED BY ATMOSPHERIC-PRESSURE AND PLASMA-ACTIVATED CHEMICAL VAPOR-DEPOSITION
    GUALANDRIS, F
    PIGNATEL, GU
    ROJAS, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (06): : 1604 - 1608
  • [49] MATERIAL EFFECTS ON LABORATORY PLASMA JETS WITH APPLIED MAGNETIC FIELDS
    Byvank, Tom
    Hamlin, Nathaniel
    Atoyan, Levon
    Seyler, Charles E.
    Kusse, Bruce R.
    2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS), 2017,
  • [50] The effect of rapid thermal annealing on properties of plasma enhanced CVD silicon oxide films
    Domínguez, C
    Rodríguez, JA
    Muñoz, FJ
    Zine, N
    THIN SOLID FILMS, 1999, 346 (1-2) : 202 - 206
12345