EFFECTS OF APPLIED MAGNETIC-FIELDS ON SILICON-OXIDE FILMS FORMED BY MICROWAVE PLASMA CVD

被引：13
|
作者：
FUKUDA, T [1 ]
SUZUKI, K [1 ]
TAKAHASHI, S [1 ]
MOCHIZUKI, Y [1 ]
OHUE, M [1 ]
MOMMA, N [1 ]
SONOBE, T [1 ]
机构：
[1] HITACHI LTD, HITACHI WORKS, HITACHI, IBARAKI 317, JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1988年 / 27卷 / 10期
关键词：
D O I：
10.1143/JJAP.27.L1962
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L1962 / L1965
页数：4
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