THE ROLE OF SILANE AND N2O IN THE CO2 LASER-CVD OF SILICON-OXIDE FILMS

被引：0
|
作者：
FERNANDEZ, D
GONZALEZ, P
POU, J
GARCIA, E
SERRA, J
LEON, B
PEREZAMOR, M
机构：
[1] Departamento de Física Aplicada, Universidad de Vigo, 36280 Vigo
来源：
APPLIED SURFACE SCIENCE | 1993年 / 69卷 / 1-4期
关键词：
D O I：
10.1016/0169-4332(93)90519-H
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The laser-CVD of silicon oxide films on silicon substrates has been carried out using a CW-CO2 laser in a parallel configuration, and with SiH4 and N2O as precursor gases. In this paper we report the influence of the reactant partial pressures on the film growth rate. The individual apparent orders of the chemical reaction for SiH4 and N2O have been determined.
引用
收藏
页码：281 / 284
页数：4
相关论文
共 50 条
  • [1] STABLE CO2 AND N2O LASER DESIGN
    THOMAS, JE
    KELLY, MJ
    MONCHALIN, JP
    KURNIT, NA
    JAVAN, A
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1980, 51 (02): : 240 - 243
  • [2] SPECTROSCOPIC STUDY OF A LASER WITH N2O AND CO2
    GAUTHIER.B
    LECUYER, A
    LEGAY, F
    COMPTES RENDUS HEBDOMADAIRES DES SEANCES DE L ACADEMIE DES SCIENCES SERIE B, 1969, 269 (15): : 708 - &
  • [3] CHEMICALLY PUMPED CO2 AND N2O LASERS - CO+-(CO2 . N2O)
    PETERSEN, AB
    WITTIG, C
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1975, 11 (08) : 699 - 700
  • [4] GROWTH-RATE AND CHARACTERIZATION OF SILICON-OXIDE FILMS GROWN IN N2O ATMOSPHERE IN A RAPID THERMAL PROCESSOR
    LANGE, P
    BERNT, H
    HARTMANNSGRUBER, E
    NAUMANN, F
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (01) : 259 - 263
  • [5] CO2 laser annealing on fluorinated silicon oxide films
    Wang, Na-Fu
    Houng, Mau-Phon
    Wang, Yeong-Her
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (9 A): : 5227 - 5231
  • [6] CO2 laser annealing on fluorinated silicon oxide films
    Wang, NF
    Houng, MP
    Wang, YH
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (9A): : 5227 - 5231
  • [7] N2O versus CO2
    Tamura, Todd
    CHEMICAL & ENGINEERING NEWS, 2008, 86 (26) : 6 - 6
  • [8] LOW-TEMPERATURE SILICON-OXIDE FILMS DEPOSITED USING A CO-2 LASER
    FERNANDEZ, D
    GONZALEZ, P
    POU, J
    LEON, B
    PEREZAMOR, M
    APPLIED SURFACE SCIENCE, 1992, 54 : 112 - 116
  • [9] LASER SPECTROSCOPY OF ETHYLENE WITH WAVEGUIDE CO2 AND N2O LASERS
    HERLEMONT, F
    LYSZYK, M
    LEMAIRE, J
    LAMBEAU, C
    FAYT, A
    JOURNAL OF MOLECULAR SPECTROSCOPY, 1979, 74 (03) : 400 - 408
  • [10] USE OF CO2 AND N2O LASER RADIATION TO DETERMINE STRENGTHS AND HALFWIDTHS OF N2O SPECTRAL-LINES
    PATTY, RR
    HARWARD, CN
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1974, 19 (10): : 1109 - 1109
12345