The impact of gate misalignment on the analog performance of a dual-material double gate junctionless transistor

被引:6
|
作者
Amin, S. Intekhab [1 ]
Sarin, R. K. [1 ]
机构
[1] BR Ambedkar Natl Inst Technol, Dept Elect & Commun Engn, Jalandhar 144011, Punjab, India
关键词
dual material double gate (DMDG); junctionless transistor; inversion mode transistor; gate misalignment; analog FOMs;
D O I
10.1088/1674-4926/36/9/094001
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The analog performance of gate misaligned dual material double gate junctionless transistor is demonstrated for the first time. The cases considered are where misalignment occurs towards source side and towards drain side. The analog performance parameters analyzed are: transconductance, output conductance, intrinsic gain and cut-off frequency. These figures of merits (FOMs) are compared with a dual material double gate inversion mode transistor under same gate misalignment condition. The impacts of different length of control gate (L-1) for a given gate length (L) are also studied and the optimum lengths L-1 under misalignment condition to have better analog FOMs and high tolerance to misalignment are presented.
引用
收藏
页数:7
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