PULSED ION-IMPLANTATION OF SILICON WITH SELENIUM

被引：0
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作者：
SERFOZO, G
NAUJOKAITIS, R
KRAFCSIK, I
DOZSA, L
BATTISTIG, G
RIEDL, P
KLOPFER, E
GERASIMENKO, NN
GYULAI, J
机构：
来源：
EPM 87: ENERGY PULSE AND PARTICLE BEAM MODIFICATION OF MATERIALS | 1988年 / 8卷
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中图分类号：
T [工业技术];
学科分类号：
08 ;
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页码：74 / 79
页数：6
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