共 50 条
- [21] The Formation of Oxide Layers on a Titanium Surface by Irradiation with Femtosecond Laser Pulses Technical Physics Letters, 2018, 44 : 1177 - 1179
- [25] Non-melt laser annealing of Plasma Implanted Boron for ultra shallow junctions in Silicon MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2008, 154 (39-42): : 39 - 42
- [27] DEFECTS IN THE NEAR-SURFACE SILICON LAYER FORMED UNDER PULSE LASER IRRADIATION PISMA V ZHURNAL TEKHNICHESKOI FIZIKI, 1988, 14 (09): : 838 - 842
- [28] Surface structure and morphology modification of silicon layers induced by nanosecond pulsed laser irradiation THIN FILMS - STRUCTURE AND MORPHOLOGY, 1997, 441 : 627 - 632
- [29] MODELS OF FORMATION AND EROSION OF A PLASMA-COLUMN IN A SILICON SURFACE-BARRIER DETECTOR REVIEW OF SCIENTIFIC INSTRUMENTS, 1987, 58 (10): : 1926 - 1932
- [30] Formation of ultrashallow junctions in 500EV boron implanted silicon using nonmelt laser annealing RTP 2004: 12th IEEE International Conference on Advanced Thermal Processing of Semiconductors : RTP 2004, 2004, : 143 - 147