PLASMA-DEPOSITED ORGANOSILICON THIN-FILMS AS DRY RESISTS FOR DEEP ULTRAVIOLET LITHOGRAPHY

被引:25
|
作者
HORN, MW
PANG, SW
ROTHSCHILD, M
机构
来源
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D O I
10.1116/1.585103
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Organosilicon thin films have been formed by plasma enhanced chemical vapor deposition and employed as deep-UV photoresists. Films 20-200 nm thick were deposited from liquid organosilicon sources onto carbon-based planarizing layers and patterned in projection with a 193 nm excimer laser. At fluences below approximately-5 mJ/cm2/pulse, exposure to 193 nm radiation induced oxygen incorporation into the film. Following either a wet or dry development step, negative-tone imaging was achieved, with the remaining photooxidized film being highly resistant to the O2 reactive ion etching employed in the subsequent pattern transfer step. At higher fluences, approximately-15 mJ/cm2, positive-tone imaging by self-development was obtained for single-pulse exposures.
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页码:1493 / 1496
页数:4
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