THE LUBRICATION OF GOLD SURFACES BY PLASMA-DEPOSITED THIN-FILMS OF FLUOROCARBON POLYMER

被引：0

作者：

WALTON, KR ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY | 1980年 / 3卷 / 02期

关键词：

D O I：

10.1109/TCHMT.1980.1135617

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：297 / 304

页数：8

共 50 条

[1] INFLUENCE OF SUBSTRATE MATERIAL AND ION-BOMBARDMENT ON PLASMA-DEPOSITED FLUOROCARBON THIN-FILMS
OKEEFE, MJ
RIGSBEE, JM
[J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1994, 53 (12) : 1631 - 1638
[2] Compositions and surface energies of plasma-deposited multilayer fluorocarbon thin films
Visser, SA
Hewitt, CE
Fornalik, J
Braunstein, G
Srividya, C
Babu, SV
[J]. SURFACE & COATINGS TECHNOLOGY, 1997, 96 (2-3): : 210 - 222
[3] CHARACTERIZATION OF PLASMA-DEPOSITED ORGANO-SILICON THIN-FILMS
SACHDEV, KG
SACHDEV, HS
[J]. THIN SOLID FILMS, 1983, 107 (03) : 245 - 250
[4] PLASMA-DEPOSITED FLUOROCARBON FILMS ON SILICON STUDIED BY ELLIPSOMETRY
OEHRLEIN, GS
REIMANIS, I
LEE, YH
[J]. THIN SOLID FILMS, 1986, 143 (03) : 269 - 278
[5] Biofluid transport on hydrophobic plasma-deposited fluorocarbon films
Bayiati, P.
Tserepi, A.
Petrou, P. S.
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Kakabakos, S. E.
Gogolides, E.
Cardinaud, C.
[J]. MICROELECTRONIC ENGINEERING, 2007, 84 (5-8) : 1677 - 1680
[6] Peculiarities of formation and growth of thin polymer plasma-deposited films
Lyakhovitch, AM
Dorfman, AM
Shirobokov, MA
[J]. FUNCTIONAL NANOMATERIALS FOR OPTOELECTRONICS AND OTHER APPLICATIONS, 2004, 99-100 : 169 - 173
[7] PHOTOELECTROCHEMICAL PROPERTIES OF PLASMA-DEPOSITED TIO2 THIN-FILMS
WILLIAMS, LM
HESS, DW
[J]. THIN SOLID FILMS, 1984, 115 (01) : 13 - 18
[8] Compositional changes in plasma-deposited fluorocarbon films during ageing
Gengenbach, TR
Griesser, HJ
[J]. SURFACE AND INTERFACE ANALYSIS, 1998, 26 (07) : 498 - 511
[9] ADHESION OF PLASMA-DEPOSITED FLUOROCARBON POLYMER-FILMS TO SKTFV-803 POLYMETHYLPHENYLVINYLSILOXANE RUBBER
CHICHAGOVA, ZS
TIKHOMIROV, LA
[J]. HIGH ENERGY CHEMISTRY, 1993, 27 (04) : 327 - 328
[10] PLASMA-DEPOSITED ORGANOSILICON THIN-FILMS AS DRY RESISTS FOR DEEP ULTRAVIOLET LITHOGRAPHY
HORN, MW
PANG, SW
ROTHSCHILD, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06): : 1493 - 1496

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