A Ku-band 3.4 W/mm power AlGaN/GaN HEMT on a sapphire substrate

被引:3
|
作者
Wang Dongfang [1 ,2 ]
Chen Xiaojuan [1 ]
Liu Xinyu [1 ]
机构
[1] Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
[2] Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
基金
中国国家自然科学基金;
关键词
AlGaN/GaN HEMT; Ku band; power;
D O I
10.1088/1674-4926/31/2/024001
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
This paper describes the first domestic Ku-band power AlGaN/GaN HEMT fabricated on a sapphire substrate. The device with a gate width of 0.5 mm and a gate length of 0.35 mu m has exhibited an extrinsic current gain cutoff frequency of 20 GHz and an extrinsic maximum frequency of oscillation of 75 GHz. Under V-DS = 30 V, CW operating conditions at 14 GHz, the device exhibits a linear gain of 10.4 dB and a 3-dB-gain-compressed output power of 1.4 W with a power added efficiency of 41%. Under pulse operating conditions, the linear gain is 12.8 dB and the 3-dB-compressed output power is 1.7 W. The power density reaches 3.4 W/mm.
引用
收藏
页数:2
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