MULTIPLE THERMAL-OXIDATION OF SILICON AND ELECTROPHYSICAL PROPERTIES OF SILICON-OXIDE FILMS AND SI-SIO2 BONDING LAYER

被引：2

作者：

KROPMAN, D ^{[1
]}

LANGOVITS, P ^{[1
]}

VINNAL, M ^{[1
]}

MEYLER, B ^{[1
]}

机构：

[1] ACAD SCI ESSSR,CYBERNETICS INST,TALLIN,ESSSR

来源：

THIN SOLID FILMS | 1976年 / 34卷 / 01期

关键词：

D O I：

10.1016/0040-6090(76)90138-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：91 / 93

页数：3

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