PHOSPHORUS DISTRIBUTION IN TASI2 FILMS BY DIFFUSION FROM A POLYCRYSTALLINE SILICON LAYER

被引：23
|
作者：
PELLEG, J
MURARKA, SP
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 03期
关键词：
D O I：
10.1063/1.332208
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1337 / 1345
页数：9
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