RESISTS FOR FINE-LINE LITHOGRAPHY

被引:6
|
作者
HATZAKIS, M
机构
关键词
D O I
10.1109/PROC.1983.12640
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:570 / 574
页数:5
相关论文
共 50 条
  • [11] CHEMICAL ETCHING DOES FINE-LINE WORK
    MCELROY, J
    [J]. AUTOMOTIVE INDUSTRIES, 1981, 161 (08): : 54 - 55
  • [12] FINE LINE LITHOGRAPHY
    THOMPSON, LF
    [J]. SOLID STATE TECHNOLOGY, 1979, 22 (05) : 59 - 59
  • [13] High aspect-ratio fine-line metallization
    Chang, CL
    Chang, PZ
    Yen, KS
    Lu, SS
    [J]. MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY IV, 1998, 3511 : 357 - 363
  • [14] 30μm Fine-Line Printing for Solar Cells
    Aoki, Mari
    Nakamura, Kyotaro
    Tachibana, Tomihisa
    Sumita, Isao
    Hayashi, Hideaki
    Asada, Hideaki
    Ohshita, Yoshio
    [J]. 2013 IEEE 39TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 2013, : 2162 - 2166
  • [15] FINE-LINE BOARD ROUTING MOVES INTO THE FAST LANE
    OHR, S
    [J]. ELECTRONIC DESIGN, 1986, 34 (02) : 42 - &
  • [16] Fabrication of Fine-line Pattern with Image Reversal Process
    Bao Shuai
    Gao Ai-hua
    Liu Huan
    Liu Wei-guo
    [J]. PRECISION ENGINEERING AND NON-TRADITIONAL MACHINING, 2012, 411 : 474 - 477
  • [17] A REVIEW OF FINE-LINE LITHOGRAPHIC TECHNIQUES - PRESENT AND FUTURE
    WATTS, RK
    BRUNING, JH
    [J]. SOLID STATE TECHNOLOGY, 1981, 24 (05) : 99 - 105
  • [18] ELECTROMIGRATION IN FINE-LINE SPUTTER-GUN AL
    VAIDYA, S
    FRASER, DB
    LINDENBERGER, WS
    [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (08) : 4475 - 4482
  • [19] FINE-LINE SCREEN PRINTING USING ETCHED METAL STENCILS
    PIAZZA, JR
    MYERS, SL
    [J]. AMERICAN CERAMIC SOCIETY BULLETIN, 1967, 46 (08): : 790 - &
  • [20] STRESS-ANALYSIS OF ENCAPSULATED FINE-LINE ALUMINUM INTERCONNECT
    JONES, RE
    BASEHORE, ML
    [J]. APPLIED PHYSICS LETTERS, 1987, 50 (12) : 725 - 727