RESISTS FOR FINE-LINE LITHOGRAPHY

被引：6

作者：

HATZAKIS, M

机构：

来源：

关键词：

D O I：

10.1109/PROC.1983.12640

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：570 / 574

页数：5

共 50 条

[1] FINE-LINE LITHOGRAPHY NEARS ITS DAY
LYMAN, J
[J]. ELECTRONICS, 1979, 52 (21): : 92 - 93
[2] A PERSPECTIVE ON RESIST MATERIALS FOR FINE-LINE LITHOGRAPHY
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[J]. ACS SYMPOSIUM SERIES, 1984, 266 : 39 - 117
[3] MICROELECTRONIC TEST STRUCTURES FOR CHARACTERIZING FINE-LINE LITHOGRAPHY
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[J]. SOLID STATE TECHNOLOGY, 1981, 24 (05) : 126 - &
[4] MULTILAYER RESISTS FOR FINE LINE OPTICAL LITHOGRAPHY
ONG, E
HU, EL
[J]. SOLID STATE TECHNOLOGY, 1984, 27 (06) : 155 - 160
[5] FINE-LINE MADNESS
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[J]. DRUG & COSMETIC INDUSTRY, 1978, 123 (06): : 41 - &
[6] STENCIL SCREENS FOR FINE-LINE PRINTING
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[J]. ELECTROCOMPONENT SCIENCE AND TECHNOLOGY, 1980, 7 (1-3): : 47 - 53
[7] SCREEN PRINTING FINE-LINE PATTERNS
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[J]. AMERICAN CERAMIC SOCIETY BULLETIN, 1967, 46 (08): : 790 - &
[8] THE ELECTROMIGRATION FAILURE DISTRIBUTION - THE FINE-LINE CASE
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[J]. JOURNAL OF APPLIED PHYSICS, 1991, 69 (04) : 2117 - 2127
[9] FINE-LINE PRINTED-CIRCUITS CATCH ON
LYMAN, J
[J]. ELECTRONICS-US, 1978, 51 (02): : 84 - +
[10] FINE-LINE SPECTRA OF CHROMIUM IONS IN CRYSTALS
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[J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (01) : 395 - &