X-RAY EXTINCTION CONTRAST TOPOGRAPHY OF SILICON STRAINED BY THIN SURFACE FILMS

被引：62
|
作者：
MEIERAN, ES
BLECH, IA
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1965年 / 36卷 / 10期
关键词：
D O I：
10.1063/1.1702943
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：3162 / &
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