X-RAY EXTINCTION CONTRAST TOPOGRAPHY OF SILICON STRAINED BY THIN SURFACE FILMS

被引：62

|

作者：

MEIERAN, ES

BLECH, IA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1965年 / 36卷 / 10期

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D O I：

10.1063/1.1702943

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：3162 / &

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