共 50 条
- [2] CHARACTERIZATION TECHNIQUES FOR X-RAY-LITHOGRAPHY SUB-MICRON METROLOGY [J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 471 : 103 - 109
- [3] CALCULATION OF THE PROFILES OF APPEARING SUB-MICRON ELEMENTS DURING X-RAY-LITHOGRAPHY [J]. DOKLADY AKADEMII NAUK BELARUSI, 1989, 33 (03): : 215 - 217
- [4] SUB-MICRON X-RAY-LITHOGRAPHY USING LASER-PRODUCED PLASMA AS A SOURCE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 367 - 368
- [6] ELECTRON-SCATTERING EFFECTS IN MASTER MASK FABRICATION BY SINGLE LAYER PROCESS FOR SUB-MICRON X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1586 - 1590
- [7] HIGH BRIGHTNESS LASER PLASMA SOURCE FOR HIGH THROUGHPUT SUB-MICRON X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 258 - 261
- [8] HIGH BRIGHTNESS LASER PLASMA SOURCE FOR HIGH THROUGHPUT SUB-MICRON X-RAY-LITHOGRAPHY [J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 537 : 198 - 205
- [10] Fabrication of sub-micron structures for MEMS using deep X-ray lithography [J]. Microsystem Technologies, 2000, 6 : 210 - 213