SUB-MICRON X-RAY-LITHOGRAPHY USING LASER-PRODUCED PLASMA AS A SOURCE

被引：35
|
作者：
YAAKOBI, B [1 ]
KIM, H [1 ]
SOURES, JM [1 ]
DECKMAN, HW [1 ]
DUNSMUIR, J [1 ]
机构：
[1] EXXON RES & ENGN CO,CORP RES LABS,LINDEN,NJ 07036
来源：
APPLIED PHYSICS LETTERS | 1983年 / 43卷 / 07期
关键词：
D O I：
10.1063/1.94535
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：686 / 688
页数：3
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