HIGH-CONTRAST STENCIL MASKS FOR HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY

被引：0

作者：

VALIEV, KA

VELIKOV, LV

MAKHMUTOV, RK

PROKHOROV, AM

机构：

来源：

DOKLADY AKADEMII NAUK SSSR | 1985年 / 284卷 / 03期

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D O I：

暂无

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

引用

页码：595 / 598

页数：4

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