HIGH-CONTRAST STENCIL MASKS FOR HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY

被引：0
|
作者：
VALIEV, KA
VELIKOV, LV
MAKHMUTOV, RK
PROKHOROV, AM
机构：
来源：
DOKLADY AKADEMII NAUK SSSR | 1985年 / 284卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号：
07 ; 0710 ; 09 ;
摘要：
引用
收藏
页码：595 / 598
页数：4
相关论文
共 50 条
  • [31] SUBMICROMETER X-RAY PRINTING WITH X-RAY MASKS DELINEATED BY HIGH-VOLTAGE ELECTRON-BEAM WRITING
    KAWABUCHI, K
    SAKURAI, S
    YOSHIMI, M
    [J]. ELECTRONICS LETTERS, 1983, 19 (08) : 287 - 288
  • [32] Novel high-contrast phase-shifting masks for EUV interference lithography
    Luettgenau, B.
    Brose, S.
    Danylyuk, S.
    Stollenwerk, J.
    Loosen, P.
    [J]. EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI, 2020, 11323
  • [33] MEASUREMENTS OF ELECTRON RANGE AND SCATTERING IN HIGH-VOLTAGE E-BEAM LITHOGRAPHY
    MANKIEWICH, PM
    JACKEL, LD
    HOWARD, RE
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 174 - 176
  • [34] Spiderweb masks for high-contrast imaging
    Vanderbei, RJ
    Spergel, DN
    Kasdin, NJ
    [J]. ASTROPHYSICAL JOURNAL, 2003, 590 (01): : 593 - 603
  • [35] Mechanical modeling of projection electron-beam lithography masks
    Univ of Wisconsin-Madison, Stoughton, United States
    [J]. Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 12 B (7564-7569):
  • [36] Mechanical modeling of projection electron-beam lithography masks
    Dicks, GA
    Engelstad, RL
    Lovell, EG
    Liddle, JA
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (12B): : 7564 - 7569
  • [37] Electron-beam lithography simulation for the fabrication of EUV masks
    Patsis, GP
    Tsikrikas, N
    Raptis, I
    Glezos, N
    [J]. MICROELECTRONIC ENGINEERING, 2006, 83 (4-9) : 1148 - 1151
  • [38] HIGH-VOLTAGE SHAPED E-BEAM LITHOGRAPHY
    JONES, GAC
    SARGENT, PM
    NORRIS, TS
    AHMED, H
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 124 - 127
  • [39] Analysis of pattern-dependent image placement of single-membrane stencil masks for electron-beam lithography
    Sano, Hisatake
    Kuwahara, Naoko
    Kitada, Minoru
    Yusa, Satoshi
    Fujita, Horoshi
    Takikawa, Tadahiko
    Hoga, Morihisa
    [J]. MICROELECTRONIC ENGINEERING, 2007, 84 (5-8) : 825 - 828
  • [40] ELECTRON-BEAM FABRICATION OF HIGH-RESOLUTION MASKS
    KENTY, JL
    PUZIO, LC
    SCHAUERTE, FJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1211 - 1214
12345