CHARACTERISTICS OF AL MASKLESS PATTERNING USING FOCUSED ION-BEAMS

被引:0
|
作者
GAMO, K [1 ]
HUANG, G [1 ]
MORIIZUMI, K [1 ]
SAMOTO, N [1 ]
SHIMIZU, R [1 ]
NAMBA, S [1 ]
机构
[1] OSAKA UNIV,FAC ENGN,DEPT APPL PHYS,SUITA,OSAKA 565,JAPAN
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中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
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页码:864 / 868
页数:5
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