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- [1] CHARACTERISTICS OF Al MASKLESS PATTERNING USING FOCUSED ION BEAMS. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1985, B7-8 (pt 2): : 864 - 868
- [2] MASKLESS FABRICATION USING FOCUSED ION-BEAMS PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 393 : 159 - 166
- [3] CHARACTERISTICS OF MASKLESS ION-BEAM ASSISTED ETCHING OF SILICON USING FOCUSED ION-BEAMS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 333 - 336
- [4] MASKLESS ETCHING OF A NANOMETER STRUCTURE BY FOCUSED ION-BEAMS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 985 - 989
- [5] MICROMACHINING USING FOCUSED ION-BEAMS PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1994, 146 (01): : 523 - 535
- [9] APPLICATIONS OF FOCUSED ION-BEAMS PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 393 : 167 - 176
- [10] FOCUSED ION-BEAMS IN MICROFABRICATION REVIEW OF SCIENTIFIC INSTRUMENTS, 1992, 63 (04): : 2364 - 2366