MICROMACHINING USING FOCUSED ION-BEAMS

被引：4
|
作者：
DRIESEL, W
机构：
[1] Max-Planck-Institut Für Mikrostrukturphysik, Halle
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1994年 / 146卷 / 01期
关键词：
D O I：
10.1002/pssa.2211460143
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Focused ion beam (FIB) systems prove to be useful precision micromachining tools for a wide variety of applications. This micromachining technique includes scanning ion microscopy (SIM), micromachining by physical sputtering, and the ion-beam induced surface chemistry for etching and deposition. This technique is applied to image and modify IC's, to micromechanical applications, to modify the tip shape of tungsten emitters, and to prepare cross sections of selected regions for inspection in a transmission electron microscope (TEM).
引用
收藏
页码：523 / 535
页数：13
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