ACTIVATION OF SHALLOW, HIGH-DOSE BF2+ IMPLANTS INTO SILICON BY RAPID THERMAL-PROCESSING

被引：15

|

作者：

POWELL, RA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 10期

关键词：

D O I：

10.1063/1.333818

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：2837 / 2843

页数：7

相关论文

共 50 条

[1] Activation behavior of BF2+ implants in RTP annealed silicon
Drobny, VF
Chang, K
Robinson, D
[J]. IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 2003, : 686 - 689
[2] RAPID THERMAL ANNEALING OF BF2+ IMPLANTED, PREAMORPHIZED SILICON
SEIDEL, TE
[J]. IEEE ELECTRON DEVICE LETTERS, 1983, 4 (10) : 353 - 355
[3] EFFECTS OF BF2+ IMPLANTS ON TITANIUM SILICIDE FORMATION BY RAPID THERMAL ANNEALING
CHOI, JS
HWANG, YS
PAEK, SH
OH, JE
SIM, TU
LEE, JG
[J]. JOURNAL OF APPLIED PHYSICS, 1992, 72 (01) : 297 - 299
[4] Doping characteristics of BF2+ implants in ⟨100⟩ and ⟨111⟩ silicon
Drobny, VF
Rubalcava, J
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (08) : 1661 - 1666
[5] SHALLOW JUNCTION FORMATION BY MEANS OF RAPID THERMAL-PROCESSING OF DOPED GLASS ON SILICON
DESOUZA, JP
HASENACK, CM
SWART, JW
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (11) : C627 - C627
[6] APPLICATIONS OF RAPID THERMAL-PROCESSING TO SILICON EPITAXY
BURNS, GP
WILKES, JG
[J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1988, 3 (05) : 442 - 447
[7] EFFECTS OF RAPID THERMAL-PROCESSING ON THERMAL OXIDES OF SILICON
LEE, SK
KWONG, DL
ALVI, NS
[J]. JOURNAL OF APPLIED PHYSICS, 1986, 60 (09) : 3360 - 3363
[8] Investigation of BF2+ implants in silicon through SiO2 films - Redistribution of fluorine and boron under rapid thermal annealing
Kaabi, L
Gontrand, C
Lemiti, M
Remaki, B
Balland, B
Meddeb, J
Marty, O
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 120 (1-4): : 68 - 73
[9] THE DOPING OF SILICON WITH BORON BY RAPID THERMAL-PROCESSING
DESOUZA, JP
HASENACK, CM
SWART, JE
[J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1988, 3 (04) : 277 - 280
[10] SHALLOW JUNCTIONS FORMED BY BF2+ IMPLANTATION INTO THIN COSI FILMS AND RAPID THERMAL ANNEALING
JUANG, MH
LIN, CT
CHENG, HC
[J]. JOURNAL OF APPLIED PHYSICS, 1994, 76 (02) : 1323 - 1325

← 1 2 3 4 5 →