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- [3] SEMICONDUCTOR DIODE-LASERS FORMED BY MICROMACHINING WITH A FOCUSED ION-BEAM [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1986, 3 (13): : P81 - P82
- [4] POTENTIAL APPLICATIONS OF FOCUSED ION-BEAM TECHNOLOGY FOR THE SEMICONDUCTOR INDUSTRY [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 10-1 (MAY): : 515 - 521
- [5] MICROMACHINING AND DEVICE TRANSPLANTATION USING FOCUSED ION-BEAM [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (10): : 2283 - 2287
- [6] FOCUSED ION-BEAM TECHNOLOGY AND APPLICATIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (02): : 469 - 495
- [7] FOCUSED ION-BEAM TECHNOLOGIES FOR LITHOGRAPHIC APPLICATIONS [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 37-8 : 218 - 223
- [8] APPLICATIONS OF A VARIABLE ENERGY FOCUSED ION-BEAM SYSTEM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2115 - 2119