FOCUSED ION-BEAM SIMS FOR MICROMACHINING APPLICATIONS

被引：0
|
作者：
HARRIOTT, LR [1 ]
VASILE, MJ [1 ]
机构：
[1] AT&T BELL LABS,MURRAY HILL,NJ 07974
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C375 / C375
页数：1
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