MICROMACHINING USING A FOCUSED ION-BEAM

被引：60
|
作者：
YOUNG, RJ
机构：
[1] FEI Europe, Brookfield Business Centre, Cottenham, Cambridge
来源：
VACUUM | 1993年 / 44卷 / 3-4期
关键词：
D O I：
10.1016/0042-207X(93)90182-A
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
This paper describes the micro-machining of micron and sub-micron scale structures by focused ion beams (FIB). The general requirements for micro -machining systems and the characteristics of FIB milling are considered. A range of applications of FIB milling are also discussed. These include failure analysis and device modification, which are now finding wide use in semiconductor research. Applications in other areas (such as optics and micro-mechanics) are increasing in number, FIB milling being a very flexible and precise method for producing prototype or specialized structures.
引用
收藏
页码：353 / 356
页数：4
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