共 50 条
- [41] CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-SILICON WITH SILANES FOR THIN-FILM TRANSISTORS - THE INFLUENCE OF THE AMORPHOUS-SILICON DEPOSITION TEMPERATURE JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (02): : 233 - 239
- [42] CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-SILICON FOR PHOTOVOLTAIC SOLAR-CELLS ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1983, 186 (AUG): : 70 - INDE
- [47] CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS HYDROGENATED SILICON - CHEMISTRY STRUCTURE PERFORMANCE RELATIONSHIPS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01): : 239 - 247
- [50] CHARACTERISTICS OF HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED BY ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMA CHEMICAL VAPOR-DEPOSITION METHOD AND THEIR APPLICATION TO PHOTODIODES JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (02): : 202 - 208