Nanoscale smoothing of plasmonic films and structures using gas cluster ion beam irradiation

We present a novel method of using gas cluster ion beam irradiation (GCIB) to flatten and widen grains in silver films and structures, while simultaneously, reducing the film thickness with nanometer precision. Ultrathin Ag films produced by GCIB have lower absorbance and better adhesion compared to as-deposited films. By applying the technique post-fabrication to plasmonic color filters, waveguides and disks, we show that an enhanced surface plasmon resonance and propagation length can be achieved.