Stable current oscillations accompanying magnetron sputtering of oxide targets

被引：0
|
作者：
A. Kh. Abduev
A. M. Magomedov
机构：
[1] Institute of Physics,
[2] Dagestan Scientific Center,undefined
来源：
Technical Physics Letters | 1998年 / 24卷
关键词：
Oxide; Oxygen; Atomic Oxygen; Magnetron Sputtering; Continuous Generation;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Undamped total current oscillations were observed for the first time during dc magnetron sputtering of oxide ceramic targets. It was shown that these oscillations were caused by the continuous generation of atomic oxygen as a result of chemisorption-desorption processes at the surface of the target heated by ion bombardment. Oscillations of an attachment nature (similar to Trichel oscillations) were observed at low pressures (P=4×10−4 Torr).
引用
收藏
页码：192 / 193
页数：1
相关论文
共 50 条
  • [21] Frequency-dependent pulsed direct current magnetron sputtering of titanium oxide films
    Kim, JY
    Barnat, E
    Rymaszewski, EJ
    Lu, TM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (02): : 429 - 434
  • [22] Iridium oxide deposition by cathodic magnetron sputtering
    Letendu, F
    Hugon, MC
    Touzeau, M
    Agius, B
    Bretagne, J
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 2002, 57 (304): : 337 - +
  • [23] Deposition of zinc oxide layers by magnetron sputtering
    Abduev, AK
    Magomedov, AM
    Shakhshaev, SO
    INORGANIC MATERIALS, 1997, 33 (03) : 282 - 284
  • [24] Deposition of Copper Oxide by Reactive Magnetron Sputtering
    Lee, J. H.
    Jeong, K. H.
    Cho, W. H.
    Ho, W. J.
    Yang, H. J.
    Kim, C. S.
    Lee, J. G.
    METALS AND MATERIALS INTERNATIONAL, 2011, 17 (06) : 917 - 921
  • [25] Deposition of copper oxide by reactive magnetron sputtering
    J. H. Lee
    K. H. Jeong
    W. H. Cho
    W. J. Ho
    H. J. Yang
    C. S. Kim
    J. G. Lee
    Metals and Materials International, 2011, 17 : 917 - 921
  • [26] Deposition of Zinc Oxide Layers by Magnetron Sputtering
    Abduev, A. K.
    Magomedov, A. M.
    Shakhshaev, S. O.
    Inorganic Materials, 33 (03):
  • [27] Challenges in the industrial deposition of transparent conductive oxide materials by reactive magnetron sputtering from rotatable targets
    Linss, Volker
    THIN SOLID FILMS, 2017, 634 : 149 - 154
  • [28] Oxide phase and conductivity-type of copper oxide thin films deposited by direct current magnetron sputtering
    Devaraj, Perumal
    Peranantham, Pazhanisami
    Jeyachandran, Yekkoni Lakshmanan
    PHYSICA B-CONDENSED MATTER, 2024, 691
  • [29] Structure formation upon reactive direct current magnetron sputtering of transition metal oxide films
    Ngaruiya, JM
    Kappertz, O
    Mohamed, SH
    Wuttig, M
    APPLIED PHYSICS LETTERS, 2004, 85 (05) : 748 - 750
  • [30] Stable p-type nitrogen-doped zinc oxide films prepared by magnetron sputtering
    Chen, J. Y.
    Zhang, H. T.
    Chen, Q.
    Husian, F.
    Cherng, Jyh-Shiarn
    VACUUM, 2020, 180 (180)
12345