Frequency-dependent pulsed direct current magnetron sputtering of titanium oxide films

被引：12

作者：

Kim, JY ^{[1
]}

Barnat, E ^{[1
]}

Rymaszewski, EJ ^{[1
]}

Lu, TM ^{[1
]}

机构：

[1] Rensselaer Polytech Inst, Ctr Integrated Elect & Elect Mfg, Troy, NY 12180 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2001年 / 19卷 / 02期

关键词：

D O I：

10.1116/1.1351064

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Dramatic dependence of dielectric properties on the pulsing frequency was found for titanium oxide films deposited using the pulsed de magnetron sputtering technique at room temperature. The frequency range studied was between 50 and 250 kHz by varying the oxygen pressure. A minimum leakage current density of 0.22 muA/cm(2) at 0.5 MV/cm electric-field strength for a film with dielectric constant of 26 was achieved for relative oxygen pressure P= 60% [P(%)= P(O2)/(P(O2) + P(Ar)] and frequency f= 200 kHz. (C) 2001 American Vacuum Society.

引用

页码：429 / 434

页数：6

共 50 条

[1] Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering
Benegra, M
Lamas, DG
de Rapp, MEF
Mingolo, N
Kunrath, AO
Souza, RM
THIN SOLID FILMS, 2006, 494 (1-2) : 146 - 150
[2] Titanium oxide thin films synthesis by pulsed - DC magnetron sputtering
Cyviene, Jurgita
Navickas, Edvinas
Milcius, Darius
Laukaitis, Giedrius
VACUUM, 2009, 83 : S91 - S94
[3] Properties of titanium nitride films prepared by direct current magnetron sputtering
Jeyachandran, Y. L.
Narayandass, Sa. K.
Mangalaraj, D.
Areva, Sami
Mieluarski, J. A.
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2007, 445 : 223 - 236
[4] Characterizations of titanium oxide films prepared by radio frequency magnetron sputtering
Martin, N
Rousselot, C
Savall, C
Palmino, F
THIN SOLID FILMS, 1996, 287 (1-2) : 154 - 163
[5] Multilayer thin films of aluminum oxide and tantalum oxide deposited by pulsed direct current magnetron sputtering for dielectric applications
Drevet, Richard
Soucek, Pavel
Mares, Pavel
Dubau, Martin
Czigany, Zsolt
Balazsi, Katalin
Vasina, Petr
VACUUM, 2023, 210
[6] The properties of TiN thin films deposited by pulsed direct current magnetron sputtering
Yeh, Tung-Sheng
Wu, Jenn-Ming
Hu, Long-Jang
THIN SOLID FILMS, 2008, 516 (21) : 7294 - 7298
[7] Helium-charged titanium films deposited by direct current magnetron sputtering
Shi, LQ
Liu, CZ
Xu, SL
Zhou, ZY
THIN SOLID FILMS, 2005, 479 (1-2) : 52 - 58
[8] Structure and hemocompatibility of titanium oxide films synthesized by continuous or pulsed DC magnetron sputtering
Xu, LX
Leng, YX
Zhou, HF
Liu, YW
Huang, N
ASBM6: ADVANCED BIOMATERIALS VI, 2005, 288-289 : 299 - 302
[9] Fluorine-doped tin oxide films grown by pulsed direct current magnetron sputtering with an Sn target
Liao, Bo-Huei
Kuo, Chien-Cheng
Chen, Pin-Jen
Lee, Cheng-Chung
APPLIED OPTICS, 2011, 50 (09) : C106 - C110
[10] Pulsed direct current magnetron sputtered nanocrystalline tin oxide films
Sivasankar Reddy, A.
Figueiredo, N. M.
Cavaleiro, A.
APPLIED SURFACE SCIENCE, 2012, 258 (22) : 8902 - 8907

← 1 2 3 4 5 →