A laser plasma source of EUV radiation for projection nanolithography

被引：2
|
作者：
S. Yu. Zuev
A. E. Pestov
N. N. Salashchenko
M. N. Toropov
N. I. Chkhalo
A. V. Shcherbakov
机构：
[1] Russian Academy of Sciences,Institute for Microstructure Physics
来源：
Bulletin of the Russian Academy of Sciences: Physics | 2013年 / 77卷 / 1期
关键词：
Test Bench; Pulse Repetition Rate; Optical Scheme; Laser Radiation Power; Reflection Factor;
D O I：
10.3103/S1062873813010243
中图分类号：
学科分类号：
摘要：
A laboratory laser plasma source of extreme ultraviolet radiation optimized for use on a nanolithography test bench at a wavelength of 13.5 nm is described. The key characteristics of the source are presented. When operating with a molybdenum target, the measured ratio of laser pulse energy conversion into radiation with a central wavelength of 13.5 nm into the half-space and in the 2% spectral band is 0.03%.
引用
收藏
页码：6 / 9
页数：3
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