Applications of laser plasma EUV source based on a gas puff target

被引：0
|
作者：
Bartnik, A. [1 ]
Fiedorowicz, H. [1 ]
Jarocki, R. [1 ]
Kostecki, J. [1 ]
Rakowski, R. [1 ]
Szczurek, A. [1 ]
Szczurek, M. [1 ]
机构：
[1] Mil Univ Technol, Inst Optoelect, PL-00908 Warsaw, Poland
来源：
PLASMA 2007 | 2008年 / 993卷
关键词：
laser-plasma; EUV; gas puff target; luminescence;
D O I：
暂无
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Laser plasma with temperature of the order of tens eV can be an efficient source of extreme ultraviolet (EUV). The radiation can be focused using different kind of optics giving sufficient fluence for some applications. In this work we present results of investigations concerning different applications of a laser plasma EUV source based on a double stream gas puff target. The experiments were connected with micromachining of organic polymers by direct photoetching luminescence excited with EUV and using the source for EUV microscopy.
引用
收藏
页码：379 / 382
页数：4
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