A laser plasma source of EUV radiation for projection nanolithography

被引：2
|
作者：
S. Yu. Zuev
A. E. Pestov
N. N. Salashchenko
M. N. Toropov
N. I. Chkhalo
A. V. Shcherbakov
机构：
[1] Russian Academy of Sciences,Institute for Microstructure Physics
来源：
Bulletin of the Russian Academy of Sciences: Physics | 2013年 / 77卷 / 1期
关键词：
Test Bench; Pulse Repetition Rate; Optical Scheme; Laser Radiation Power; Reflection Factor;
D O I：
10.3103/S1062873813010243
中图分类号：
学科分类号：
摘要：
A laboratory laser plasma source of extreme ultraviolet radiation optimized for use on a nanolithography test bench at a wavelength of 13.5 nm is described. The key characteristics of the source are presented. When operating with a molybdenum target, the measured ratio of laser pulse energy conversion into radiation with a central wavelength of 13.5 nm into the half-space and in the 2% spectral band is 0.03%.
引用
收藏
页码：6 / 9
页数：3
相关论文
共 50 条
  • [21] Xenon discharge produced plasma radiation source for EUV lithography
    Zhang, CH
    Katsuki, S
    Horta, H
    Imamura, I
    Kondo, Y
    Namihira, T
    Akiyama, H
    Conference Record of the 2005 IEEE Industry Applications Conference, Vols 1-4, 2005, : 2320 - 2323
  • [22] Debris and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance
    Allain, J. P.
    Nieto, M.
    Hendricks, M.
    Harilal, S. S.
    Hassanein, A.
    DAMAGE TO VUV, EUV, AND X-RAY OPTICS, 2007, 6586
  • [23] Dual-pulse bispectral laser excitation and plasma initiation in an extreme-UV radiation source for nanolithography
    Seisyan, R. P.
    Bespalov, V. G.
    Zhevlakov, A. P.
    Makarov, E. A.
    Rodionov, A. Yu.
    JOURNAL OF OPTICAL TECHNOLOGY, 2017, 84 (11) : 753 - 760
  • [24] Direct structuring of solids by EUV radiation from a table-top laser produced plasma source
    Barkusky, Frank
    Bayer, Armin
    Peth, Christian
    Mann, Klaus
    DAMAGE TO VUV, EUV, AND X-RAY OPTICS II, 2009, 7361
  • [25] Direct photo-etching of PMMA by focused EUV radiation from a compact laser plasma source
    Barkusky, Frank
    Bayer, Armin
    Peth, Christian
    Mann, Klaus
    PHOTON PROCESSING IN MICROELECTRONICS AND PHOTONICS VII, 2008, 6879
  • [26] Prepulse-induced shock waves in the gas jet target of a laser plasma EUV radiation source
    Garbaruk, A. V.
    Gritskevich, M. S.
    Kalmykov, S. G.
    Mozharov, A. M.
    Sasin, M. E.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2017, 50 (02)
  • [27] Nanoscale imaging using a compact laser plasma EUV source
    Wachulak, Przemyslaw
    Bartnik, Andrzej
    Fiedorowicz, Henryk
    Kostecki, Jerzy
    Jarocki, Roman
    Szczurek, Miroslaw
    Szczurek, Anna
    Feigl, Torsten
    Pina, Ladislav
    X-RAY OPTICS AND MICROANALYSIS, 2012, 1437 : 79 - 82
  • [28] The development of laser-produced plasma EUV light source
    Yang, De-Kun
    Wang, Du
    Huang, Qiu-Shi
    Song, Yi
    Wu, Jian
    Li, Wen-Xue
    Wang, Zhan-Shan
    Tang, Xia-Hui
    Xu, Hong-Xing
    Liu, Sheng
    Gui, Cheng-Qun
    CHIP, 2022, 1 (03):
  • [29] Development of EUV light source by laser-produced plasma
    Izawa, Y.
    Miyanaga, N.
    Nishimura, H.
    Fujioka, S.
    Aota, T.
    Tao, Y.
    Uchida, S.
    Shimada, Y.
    Hashimoto, K.
    Yamaura, M.
    Nishihara, K.
    Murakami, M.
    Sunahara, A.
    Furukawa, H.
    Sasaki, A.
    Nishikawa, W.
    Tanuma, H.
    Norimatsu, T.
    Nagai, K.
    Gu, Q.
    Nakatsuka, M.
    Fujita, H.
    Tsubakimoto, K.
    Yoshida, H.
    Mima, K.
    JOURNAL DE PHYSIQUE IV, 2006, 133 : 1161 - 1165
  • [30] Laser-produced-plasma light source for EUV lithography
    Soumagne, G
    Abe, T
    Suganuma, T
    Imai, Y
    Someya, H
    Hoshino, H
    Nakano, M
    Komori, H
    Takabayashi, Y
    Ariga, T
    Ueno, Y
    Wada, Y
    Endo, A
    Toyoda, K
    Emerging Lithographic Technologies IX, Pts 1 and 2, 2005, 5751 : 822 - 828
12345