Longitudinal and latitudinal split-gate field-effect transistors for NAND and NOR logic circuit applications

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作者
Minjong Lee
Chang Yong Park
Do Kyung Hwang
Min-gu Kim
Young Tack Lee
机构
[1] Inha University,Department of Electrical and Computer Engineering
[2] The University of Texas at Dallas,Department of Materials Science and Engineering
[3] Korea Institute of Science and Technology (KIST),Center for Opto
[4] University of Science and Technology (UST),Electronic Materials and Devices, Post
[5] Inha University,Silicon Semiconductor Institute
[6] Inha University,Division of Nanoscience and Technology, KIST School
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摘要
Two-dimensional (2D) materials have been extensively adopted in various device architectures for advanced applications owing to their structural diversity, high functionality, and ease of integration. Among the various architectures, split-gate field-effect transistors (SG-FETs) have been widely studied based on their sequentially located SG electrode along the source/drain electrodes. In this paper, we propose two different homogeneous molybdenum disulfide (MoS2)-based SG-FET structures, namely AND-FET and OR-FET, whose gap directions are perpendicular to each other. It can exhibit AND or OR switching characteristics if it has a longitudinal or latitudinal gapped SG structure, respectively. Moreover, the AND-FET and OR-FET are regarded as folded structures of series and parallel connections of two n-type transistors. By using these switching devices, we successfully demonstrate NAND and NOR logic gates through a single active channel. These approaches are expected to pave the way for the realization of multi-functionality and high integration of 2D material-based future electronic devices.
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