Characterization of heavily Sn-doped GaAs grown by migration-enhanced epitaxy

被引:1
|
作者
Chavanapranee, Tosaporn
Horikoshi, Yoshiji
机构
[1] Waseda Univ, Sch Sci & Engn, Shinjuku Ku, Tokyo 1698555, Japan
[2] Waseda Univ, Kagami Mem Lab Mat Sci & Technol, Shinjuku Ku, Tokyo 1690072, Japan
基金
日本学术振兴会;
关键词
doping; impurities; segregation; migration enhanced epitaxy; molecular-beam epitaxy; semiconducting gallium arsenide;
D O I
10.1016/j.jcrysgro.2006.11.058
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The saturation of electron concentration and mobility at high doping concentration observed in the samples grown by low-temperature migration-enhanced epitaxy (MEE) is found to be strongly related to the morphology change in the film. The structural characteristics of the heavily Sn-doped GaAs have been further investigated by means of X-ray diffraction (XRD) measurement and transmission electron microscopy (TEM). The results indicate that the (GaAs)(1-x)(Sn-2)(x) alloy is formed in the Sn-doped GaAs with the doping concentration higher than 1 x 10(19) cm(-3). However, when the Sn concentration exceeds 1 x 10(21) cm(-3), the formation of Sn-rich clusters becomes dominant. This formation of (GaAs)(1-x)(Sn-2)(x) alloy and Sn clusters is found to be responsible for the saturation of the electron concentration and mobility in the heavily doped samples. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:225 / 229
页数:5
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