ER LUMINESCENCE-CENTERS IN GAAS GROWN BY MIGRATION-ENHANCED EPITAXY

被引:13
|
作者
TAGUCHI, A
KAWASHIMA, M
TAKAHEI, K
HORIKOSHI, Y
机构
[1] NTT Basic Research Laboratories, Musashino-shi, Tokyo 180
关键词
D O I
10.1063/1.109837
中图分类号
O59 [应用物理学];
学科分类号
摘要
Er-doped GaAs has been grown by migration-enhanced epitaxy. The samples were grown at 300, 400, and 500-degrees-C. Secondary ion mass spectroscopy measurements showed that the Er concentration in the grown epitaxial layer does not depend on the growth temperature between 300 and 500-degrees-C. All samples showed luminescence due to the Er intra-4f-shell transition from the I-4(13/2) excited state to the I-4(15/2) ground state, but the spectra change drastically when the growth temperature is increased from 300-degrees-C to 400 or 500-degrees-C. The photoluminescence spectra of the samples grown above 400-degrees-C are simpler than that of the sample grown at 300-degrees-C. The spectrum of the sample grown at 300-degrees-C became broad after annealing, whereas the spectra of the samples grown at 400-degrees-C and above showed only changes in the relative intensity of the main luminescence lines. Some thermally stable Er luminescence centers seem to be preferentially formed at 400 and 500-degrees-C.
引用
收藏
页码:1074 / 1076
页数:3
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