Obtaining TiN Coatings by Reactive Anodic Evaporation of Titanium in a Gas Discharge with a Self-Heated Hollow Cathode

被引:1
|
作者
Men'shakov, A., I [1 ,2 ]
Emlin, D. R. [1 ]
机构
[1] Russian Acad Sci, Inst Electrophys, Ural Branch, Ekaterinburg 620016, Russia
[2] Ural Fed Univ, Ekaterinburg 620075, Russia
基金
俄罗斯科学基金会;
关键词
titanium nitride; anodic evaporation; self-heated hollow cathode; PVD; PLASMA; DEPOSITION;
D O I
10.1134/S1063785021050254
中图分类号
O59 [应用物理学];
学科分类号
摘要
We propose a method for obtaining TiN coatings by reactive anodic evaporation of titanium using a high-current (30 A) discharge with a self-heated hollow cathode in an Ar + N-2 gas mixture. The optical spectral analysis shows that the gas-discharge plasma contains a large amount of activated titanium, while the fraction of singly charged metal ions supplied from the plasma to substrate reaches up to 70%. Titanium coatings with 2-mu m thickness and up to 24-GPa hardness were obtained at a nitrogen flow rate of 5 cm(3)/min. The rate of TiN deposition at a distance of 7 cm from the vapor source amounted to similar to 4 mu m/h.
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页码:511 / 514
页数:4
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