X-ray reflectivity characterization of SiO2 thin film on Ni substrate

被引：0
|
作者：
Gupta, A [1 ]
Dassanacharya, BA [1 ]
Thakur, S [1 ]
机构：
[1] Interuniv Consortium DAE Facil, Indore 452017, Madhya Pradesh, India
来源：
SOLID STATE PHYSICS, VOL 41, 1998 | 1999年
关键词：
D O I：
暂无
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
A thin SiO2 film deposited on polished Ni substrate has been characterised using x-ray reflectivity A systematic analysis of the reflectivity pattern yields information about various aspects of the film like, film thickness, ms roughness of the interfaces, refractive index of the deposited film etc., without taking recourse to involved least square fitting routines. It is found that SiO2 can be a good material for spacer layers in x-my and neutron mirrors.
引用
收藏
页码：306 / 307
页数：2
相关论文
共 50 条
  • [31] Stability of thermoresponsive methylcellulose thin film: x-ray reflectivity study
    Innis-Samson, Vallerie Ann
    Sakurai, Kenji
    X-RAY SPECTROMETRY, 2009, 38 (05) : 376 - 381
  • [32] X-ray reflectivity characterisation of thin-film and multilayer structures
    Zaumseil, P
    Materials for Information Technology: Devices, Interconnects and Packaging, 2005, : 497 - 505
  • [33] Thickness and roughness analysis on YSZ/Si(001) epitaxial films with ultra thin SiO2 interface by X-ray reflectivity
    Chen, CH
    Wakiya, N
    Saiki, A
    Shinozaki, K
    Mizutani, N
    ELECTROCERAMICS IN JAPAN III, 2000, 181-1 : 121 - 124
  • [34] Thickness and roughness analysis on YSZ/Si(001) epitaxial films with ultra thin SiO2 interface by X-ray reflectivity
    Chen, Chun-Hua
    Wakiya, Naoki
    Saiki, Atsushi
    Shinozaki, Kazuo
    Mizutani, Nobuyasu
    Key Engineering Materials, 2000, 181 : 121 - 124
  • [35] Accurate determination of SiO2 film thickness by x-ray photoelectron spectroscopy
    Takahashi, K
    Nohira, H
    Hirose, K
    Hattori, T
    APPLIED PHYSICS LETTERS, 2003, 83 (16) : 3422 - 3424
  • [36] X-RAY REFLECTIVITY STUDY OF RF-SPUTTERED THIN SIO2-FILMS
    BENDER, A
    GERBER, T
    ALBRECHT, H
    HIMMEL, B
    THIN SOLID FILMS, 1993, 229 (01) : 29 - 32
  • [37] Characterization of a HfO2/SiO2/Si system by X-ray reflection and X-ray emission spectroscopies
    André, JM
    Filatova, EO
    Renault, O
    Damlencourt, JF
    Martin, F
    Jonnard, P
    SURFACE AND INTERFACE ANALYSIS, 2006, 38 (04) : 777 - 780
  • [38] HIGH-RESOLUTION X-RAY PHOTOEMISSION SPECTROSCOPY STUDIES OF THIN SIO2 AND SI/SIO2 INTERFACES
    HATTORI, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (04): : 1528 - 1532
  • [39] ZnO thin film characterization by X-ray reflectivity optimization using genetic algorithm and Fourier transformation
    Solookinejad, Ghahraman
    Rozatian, Amir Sayid Hassan
    Habibi, Mohammad Hossein
    APPLIED SURFACE SCIENCE, 2011, 258 (01) : 260 - 264
  • [40] Image plate X-ray diffraction and X-ray reflectivity characterization of protective coatings and thin films
    Lee, SL
    Windover, D
    Doxbeck, M
    Nielsen, M
    Kumar, A
    Lu, TM
    THIN SOLID FILMS, 2000, 377 : 447 - 454
12345