X-ray reflectivity characterization of SiO2 thin film on Ni substrate

被引：0
|
作者：
Gupta, A [1 ]
Dassanacharya, BA [1 ]
Thakur, S [1 ]
机构：
[1] Interuniv Consortium DAE Facil, Indore 452017, Madhya Pradesh, India
来源：
SOLID STATE PHYSICS, VOL 41, 1998 | 1999年
关键词：
D O I：
暂无
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
A thin SiO2 film deposited on polished Ni substrate has been characterised using x-ray reflectivity A systematic analysis of the reflectivity pattern yields information about various aspects of the film like, film thickness, ms roughness of the interfaces, refractive index of the deposited film etc., without taking recourse to involved least square fitting routines. It is found that SiO2 can be a good material for spacer layers in x-my and neutron mirrors.
引用
收藏
页码：306 / 307
页数：2
相关论文
共 50 条
  • [21] Neutron reflectometry, x-ray reflectometry, and spectroscopic ellipsometry characterization of thin SiO2 on Si
    Dura, JA
    Richter, CA
    Majkrzak, CF
    Nguyen, NV
    APPLIED PHYSICS LETTERS, 1998, 73 (15) : 2131 - 2133
  • [22] Investigation of Ni reaction with sputtered amorphous SiGe thin film on SiO2 substrate
    Qu, XP
    Duan, P
    Wu, YQ
    Chen, T
    Wang, GW
    Ru, GP
    Li, BZ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (01): : 20 - 24
  • [23] X-ray and neutron reflectivity measurements for characterizing thin gold film x-ray reflectors
    Lodha, GS
    Basu, S
    Gupta, A
    Pandita, S
    Nandedkar, RV
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1997, 163 (02): : 415 - 424
  • [24] Structural characterization of a pentacene monolayer on an amorphous SiO2 substrate with grazing incidence X-ray diffraction
    Fritz, SE
    Martin, SM
    Frisbie, CD
    Ward, MD
    Toney, MF
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2004, 126 (13) : 4084 - 4085
  • [25] Characterization of Ni/Zr System by X-Ray Reflectivity Measurements
    Bhattacharya, Debarati
    Moundekar, Pooja
    Basu, Saibal
    SOLID STATE PHYSICS, VOL 57, 2013, 1512 : 768 - 769
  • [26] Nondestructive characterization of thin silicides using x-ray reflectivity
    Detavernier, C
    De Gryse, R
    Van Meirhaeghe, RL
    Cardon, F
    Ru, GP
    Qu, XP
    Li, BZ
    Donaton, RA
    Maex, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2000, 18 (02): : 470 - 476
  • [27] RESONANT X-RAY REFLECTIVITY MEASUREMENTS OF A NI/FE ALLOY THIN-FILM - A COMPOSITION PROFILE
    BAI, J
    TOMKIEWICZ, M
    MONTANO, PA
    ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER, 1995, 97 (03): : 465 - 472
  • [28] Physical structures of SiO2 ultrathin films probed by grazing incidence x-ray reflectivity
    Azuma, Y
    Fan, JW
    Kojima, I
    Wei, S
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (12)
  • [29] Energy-dispersive, x-ray reflectivity density measurements of porous SiO2 xerogels
    Windover, D
    Lu, TM
    Lee, SL
    Kumar, A
    Bakhru, H
    Jin, C
    Lee, W
    APPLIED PHYSICS LETTERS, 2000, 76 (02) : 158 - 160
  • [30] IN-SITU X-RAY REFLECTIVITY MEASUREMENT OF THIN FILM GROWTH
    Lee, Chih-Hao
    Tseng, Sung-Yuh
    ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES, 1996, 52 : C473 - C473
12345