Energy-dispersive, x-ray reflectivity density measurements of porous SiO2 xerogels

被引：19
|
作者：
Windover, D [1 ]
Lu, TM
Lee, SL
Kumar, A
Bakhru, H
Jin, C
Lee, W
机构：
[1] Rensselaer Polytech Inst, Ctr Integrated Elect & Elect Mfg, Troy, NY 12180 USA
[2] ARDEC, Benet Labs, Watervliet, NY 12189 USA
[3] SUNY Albany, Albany, NY 12222 USA
[4] Texas Instruments Inc, Dallas, TX 75265 USA
来源：
APPLIED PHYSICS LETTERS | 2000年 / 76卷 / 02期
关键词：
D O I：
10.1063/1.125688
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
X-ray reflectivity has been used to measure nondestructively the density of thin, porous, silica xerogels used for interlayer dielectric applications. The critical angle, defined through total external reflection, was measured for multiple x-ray energies to correct for sample misalignment error in the determination of the density for the films. This density was used to extrapolate the percentage porosity, assuming a bulk SiO2 density standard. The results were compared to those obtained by Rutherford backscattering and ellipsometry techniques. (C) 2000 American Institute of Physics. [S0003-6951(00)00702-6].
引用
收藏
页码：158 / 160
页数：3
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