Achieving high trace-metal purity levels using dynamic reaction cell ICP-MS

被引:0
|
作者
Ping, CM [1 ]
Kishi, Y
Kawabata, K
Thomas, R
机构
[1] Merck, Singapore, Singapore
[2] PerkinElmer Instruments, Semicond Business Unit, Shelton, CT USA
[3] Sci Solut, Gaithersburg, MD USA
来源
MICRO | 2003年 / 21卷 / 03期
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:37 / 42
页数:6
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